Description

specializes in producing spray dry and non-spray dry high purity Silicon Dioxide Powder with the smallest possible average grain sizes for use in the preparation of pressed and bonded sputtering targets and in Chemical Vapor Deposition (CVD) and Physical Vapor Deposition (PVD) processes including Thermal and Electron Beam (E-Beam) Evaporation, Low High Purity (99.999%) Silicon Oxide (SiO2)PowderTemperature Organic Evaporation, Atomic Layer Deposition (ALD), Metallic-Organic and Chemical Vapor Deposition (MOCVD). Powders are also useful in any application where high surface areas are desired such as water treatment and in fuel cell and solar applications. Nanoparticles also produce very high surface areas. Our standard powder particle sizes average in the range of – 325 mesh, – 100 mesh, 10-50 microns, and submicron (< 1 micron) and our spray dried powder with binder provide an extremely narrow particle size distribution (PSD) for use in thermal and plasma spray guns and other coating applications. We can also provide many materials in the nanoscale range. We also produce Silicon Dioxide as pellets, pieces, tablets, and sputtering targets. Oxide compounds are not conductive to electricity. However, certain perovskite structured oxides are electronically conductive finding application in the cathode of solid oxide fuel cells and oxygen generation systems. Other shapes are available by request.